PRO 500 S-SP

Ultimate pressure: 10e-7mbar Range
Sputter Techniques: round or square sputter sources, Ion assisted deposition (IAD)
Pumping system: Cryogenic pump, Turbo pump, Rotary pump/booster pump
Pressure gauge control: High pressure opening gauge, Ion gauge low pressure, Pirani gauge
Suitable for: Research and Development and small batch production

High Vacuum PVD Sputter System

Application

 

 

The PRO500S-SP high vacuum PVD coating system is PROVAC’s solution for flexible sputter coating techniques in the fields of semiconductor, III-V materials, MEMS and Nano processes industry.

Integration of the most sophisticated and timetested instruments and components by industrial leaders allows the production of thin film coatings on various materials using a wide range of coating materials.

 

Advanced yet simplified software designed to satisfy the most demanding process engineer, providing a very user friendly interface for the beginning technician.

 

Complete process automation, remote control, trending, data analysis and recovery. The system is best suited for laboratory and pilot production of single and multilayer, metallic and dielectric coatings.

Design

 

The versatile, fully automatic sputter cubic batch coating system with a flat calotte diameter of 500 mm can be equipped according to the customer applications with all requested accessories as heaters, substrate holders, evaporation and ion sources, etc.

 

The basic system consists of a water heated/ cooled chamber and door including rotary drive, water battery on frame and power rack. The fully automatic PC control ensures an operator friendly control. The system can be equipped with either cryo, turbo molecular high vacuum pump and a standard or dry fore vacuum pump set including vacuum pressure monitoring.

Performance

 

To perform precise metallization layers or reactive processes a system dedicated system with high repeatability and good uniformity is essential. The PROVAC PRO 500S-SP is a very cost effective Batch sputter system, ideal for special R&D and pilot production projects.

 

The PRO500S-SP has excellent repeatability able to coat a metal layer with a uniformity of < 3% on a 4” substrate.

Basic Configuration

 

  • Vacuum chamber internal dimensions H = 660 mm, W = 534 mm; with partly welded round pipes for water cooling/heating; High quality stainless steel 1.4301" Inner surfaces sand blasted
  • Aluminium profile frame for vacuum chamber
  • Front door including 1 inspection window with changeable glass with partly welded round pipes for water cooling/heating
  • Polarisation filter
  • Chevron
  • Effective calotte diameter D = 500 mm, for 2, 3, 4, inch wafers
  • Front wall painted in RAL 7025, clean room compatible
  • Cryopump SUMITOMO CP-8
  • VAT Valve Serie 140 DN200
  • Pre vacuum pump system type: PFEIFFER DUO 35M
  • Vacuum valves, vacuum conducts
  • Vacuum switch
  • Distribution box vacuum
  • Pressure (Vacuum) monitoring system, consisting of: Compact Pirani Gauge TPR 280 Compact Full Range Cold Ionisation Gauge PKR 251 Water battery for water cooling including maintenance free water flow sensors
  • Rotary drive PD250 with maintenance free Ferro fluidics feed through, Double bearings for optimized operating characteristics, Maintenance free AC-motor, Rotation speed 0 - 30 rpm, Rotation also possible when chamber door open
  • Protective coating shields for internal of vacuum chamber, all protective shields are made by high quality stainless steel 1.4301"
  • Calotte support
  • Distribution shaper
  • Accessories

Electric Basic System with:

 

  • PROVAC process control
  • Control rack, Industrial-PC, Keyboard, Mouse
  • 17” LC TFT display monitor mounted in control rack
  • PC extension for remote diagnosis
  • Power distributor
  • UPS battery back up for PC and return signals, including option for controlled shut-down of complete system during power fails, thunderstorms etc.
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